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Chemical/Microstructural Characterisation Equipment

DTA/TG 1750°C	XRD powder crystallography system
DSC -170°C +600°C	XRD thin film crystallography system
SEM with EDS and EBSP	XRD texture crystallography system
TEM 200 kV with EDS	XRD 4 circles goniometer system
AFM	Thin film characterisation by ellipsometry
Vista MPX axial simultaneous ICP-AE Spectrometer	167-785 nm Wavelength range Resolution 0.009 at 200 nm

Last reviewed: 9 October, 2007

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