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Chemical/Microstructural Characterisation Equipment

  DTA/TG 1750°C   XRD powder crystallography system
  DSC -170°C +600°C   XRD thin film crystallography system
  SEM with EDS and EBSP   XRD texture crystallography system
  TEM 200 kV with EDS   XRD 4 circles goniometer system
  AFM   Thin film characterisation by ellipsometry
  Vista MPX axial simultaneous ICP-AE Spectrometer   167-785 nm Wavelength range Resolution 0.009 at 200 nm


 

 


 
 

 

 
  Last reviewed: 9 October, 2007 
 
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